Organic Chemical Materials

11-Eicosenoic Acid, Methyl Ester, (Z)-; Methyl Cis-11-Eicosenoate

1-(4-Hydroxyphenyl)Hexane; 4-Hexyl-1-Cyclohexanol; 4-Hexyl-Pheno; Phenol, 4-Hexyl-; P-N-Hexylphenol; 4-Hexylphenol

Kodak CD-3; N-(2-((4-Amino-3-Methylphenyl)(Ethyl)Amino)Ethyl)Methanesulfonamide Sulfate(2:3); CD III; Methanesulfonamide, N-[2-[(4-Amino-3-Methylphenyl)Ethylamino]Ethyl]-, Sulfate (2:3); N-(2-((4-Amino-3-Methylphenyl)(Ethyl)Amino)Ethyl)Methanesulfonamide Sulfate (2:3); CD 003; CD 3; FCD 03; N-(2-(4-Amino-N-Ethyl-m-Toluidino)Ethyl)Methanesulphonamide Sesquisulphate; Methanesulfonamide, N-(2-((4-Amino-3-Methylphenyl)Ethylamino)Ethyl)-, Sulfate (2:3); CD-3; Methanesulfonamide, N-(2-(4-Amino-N-Ethyl-m-Toluidino)Ethyl)-, Sulfate (2:3); N-(2-(4-Amino-N-Ethyl-m-Toluidino)Ethyl)Methanesulfonamide Sulfate (2:3); N-[2-(4-Amino-N-Ethyl-3-Methylanilino)Ethyl]Methanesulfonamide;Sulfuric acid; N-(2-((4-Amino-3-Methylphenyl)Ethylamino)Methanesulfonamide Sulfate (2:3); N-(2-(4-Amino-N-Ethyl-m-Toluidino)Ethyl)Methanesulfonamide Sesquisulfate; Methanesulfonamide, N-[2-[(4-Amino-3-Methylphenyl)Ethylamino]Ethyl]-,Sulfate (2:3), Dihydrate; 4-(N-Ethyl-N-2-Methanesulfonylaminoethyl)-2-Methylphenylenediamine; N4-Ethyl-N4-(2-Methanesulfonamidoethyl)-2-Methyl-1,4-Phenylenediamine Sesquisulfate Monohydrate; N-[2-[(4-Amino-3-Methylphenyl)Ethylamino]Methanesulfonamide Sulfate (2:3); N-{2-[(4-Amino-3-Methylphenyl)(Ethyl)Amino]Ethyl}Methanesulfonamide Sulfate (2:3); 4-Amino-N-Ethyl-N-(.BETA.-Methanesulfonamidoethyl)-M-Toluidine Sesquisulfate; Metanosulfonamida, N-[2-[(4-Amino-3-Metilfenil) Etilamino] etil]-, Sulfato (2:3); N-(2-((4-Amino-3-Methylphenyl)(Ethyl)Amino)Ethyl)Methanesulfonamide Sesquisulfate; N-[2-[(4-Amino-3-Methylphenyl)Ethylamino]Ethyl]Methanesulfonamide Sesquisulfate; N4-Ethyl-N4-(2-Methanesulfonamidoethyl)-2-Methyl-1,4-Phenylenediamine Sesquisulfate; Methanesulfonamide, N-[2-[(4-Amino-3-Methylphenyl)Ethylamino]Ethyl]-, Sulfate (2:3), Dihydrate

4,4'-(1,3-Phenylenedioxy)Dianiline; 4-[3-(4-Aminophenoxy)Phenoxy]Aniline; RODA; Resorcinol Oxydianiline; Benzenamine, 4,4'-[1,3-Phenylenebis(oxy)]bis-; 1,3-Phenylenedi(4-Aminophenyl Ether); 1,3-Phenylene-di-4-Aminophenyl Ether; Aniline, p,p'-(m-Phenylenedioxy)DI-; Benzenamine, 4,4'-(1,3-Phenylenebis(oxy))bis-; 1,3-Bis(4-Aminophenoxy)Benzene(TPE-R); 1,3-bis(4'-Aminophenoxyl)Benzene; 4,4-(1,3-Phenylenedioxy)Dianiline; 4,4'-(m-Phenylenedioxy)Dianiline; Resorcinol Bis(4-Aminophenyl) Ether; 1,3-bis(p-Aminophenoxy)Benzene; 1H-Imidazole, 5-Ethyl-2-Methyl-; 4-[3-(4-Azanylphenoxy)Phenoxy]Aniline; 4,4'-(1,3-Phenylenebis(oxy))Dianiline; 1,3-Bis(4-Aminophenoxy)Benzene (TPE-R); [4-[3-(4-Aminophenoxy)Phenoxy]Phenyl]Amine; 4,4'-[Benzene-1,3-Diylbis(oxy)]Dianiline; 4-[3-(4-Aminophenoxy)Phenoxy]Phenylamine; 4,4 Inverted Exclamation mark -(1,3-Phenylenedioxy)Dianiline

Tfpa; Rarechem Al Be 1046; Trifluoromethylacetic Acid; 3,3,3-Trifluoropropionicacid; 3,3,3-Trifluoropropanoicacid; Propanoic Acid, 3,3,3-Trifluoro-